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  1. Ashkan Shafiee, Muhamad Mat Salleh, Muhammad Yahaya
    HOMO and LUMO of organic compounds are basic parameters for the design and fabrication of an organic solar cell. This paper presents a technique to obtain HOMO and LUMO of an n-type polymer of [6,6]-phenyl C61-butyric acid 3-ethylthiophene ester (PCBE) and a p-type polymer of poly (3-octyl-thiophene-2, 5-diyl) (P3OT). The energy of band gap for each material has been calculated using optical absorption spectrum. Cyclic Voltammetry was used to estimate the oxidation potential and energy band diagram consequently. The experiments were carried out in a three-electrode cell consisting of a platinum working electrode, a platinum counter electrode and a SCE reference electrode. P3OT showed energy band gap equal to 1.83 eV with HOMO and LUMO equal to 5.59 eV and 3.76 eV, respectively. PCBE showed energy band gap equal to 1.96 eV with HOMO and LUMO equal to 5.87 eV and 3.91 eV, respectively. Based on energy band diagram that was constructed from this experimental result, the couple materials may be successfully used to fabricate the feasible organic solar cells.
  2. Wan Zurina Samad, Mohd Ambar Yarmo, Muhamad Mat Salleh, Ashkan Shafiee
    This paper reports on structural, optical transmittance and electrical properties of fluorine-doped tin oxide (FTO) thin films deposited using an inkjet printer. The FTO ink was synthesized from a mixture of tin chloride pentahydrate (SnCl4.5H2O) and ammonium fluoride (NH4F) solutions. The thin films were deposited on glass substrates at ambient temperature or heated at 40oC and 60oC. The surface electronic state and the elemental composition of the thin films were analyzed using XPS spectroscopy. The spectra of the FTO thin films revealed that tin, oxygen, fluoride and carbon were present in the samples. The signals corresponding to Sn 3d5/2, O1s, and F1s were found at 486.6 eV, 530.5 eV and 684.5 eV, respectively. XRD analysis showed that the FTO films were in the form of crystalline with cassiterite shape. The optical and electrical properties of the films were affected by the deposition temperatures. It was observed the film deposited at 40oC has the optimum optical transmittance and sheet resistivity which were 91%T and 16 Ω/, respectively.
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