Affiliations 

  • 1 Faculty of Electrical Engineering, Universiti Teknologi Malaysia, Johor, Skudai 81310, Malaysia. mastura@fke.utm.my
  • 2 Malaysia-Japan International Institute of Technology, Universiti Teknologi Malaysia, Jalan Semarak, Kuala Lumpur 54100, Malaysia. mtahsin2@live.utm.my
  • 3 Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan. h_chikita@nano.ed.kyushu-u.ac.jp
  • 4 Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan. y_kinoshita@nano.ed.kyushu-u.ac.jp
  • 5 Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan. s_muta@nano.ed.kyushu-u.ac.jp
  • 6 Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan. maniuz@gmail.com
  • 7 Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan. j_park@nano.ed.kyushu-u.ac.jp
  • 8 Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan. r_matsumura@nano.ed.kyushu-u.ac.jp
  • 9 Faculty of Electrical Engineering, Universiti Teknologi MARA, Selangor, Shah Alam 40450, Malaysia. nanouitm@gmail.com
  • 10 Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan. sadoh@ed.kyushu-u.ac.jp
  • 11 Malaysia-Japan International Institute of Technology, Universiti Teknologi Malaysia, Jalan Semarak, Kuala Lumpur 54100, Malaysia. abd_manaf@ic.utm.my
Materials (Basel), 2014 Feb 24;7(2):1409-1421.
PMID: 28788521 DOI: 10.3390/ma7021409

Abstract

The effects of annealing temperatures on composition and strain in Si
x
Ge1-x, obtained by rapid melting growth of electrodeposited Ge on Si (100) substrate were investigated. Here, a rapid melting process was performed at temperatures of 1000, 1050 and 1100 °C for 1 s. All annealed samples show single crystalline structure in (100) orientation. A significant appearance of Si-Ge vibration mode peak at ~400 cm-1 confirms the existence of Si-Ge intermixing due to out-diffusion of Si into Ge region. On a rapid melting process, Ge melts and reaches the thermal equilibrium in short time. Si at Ge/Si interface begins to dissolve once in contact with the molten Ge to produce Si-Ge intermixing. The Si fraction in Si-Ge intermixing was calculated by taking into account the intensity ratio of Ge-Ge and Si-Ge vibration mode peaks and was found to increase with the annealing temperatures. It is found that the strain turns from tensile to compressive as the annealing temperature increases. The Si fraction dependent thermal expansion coefficient of Si
x
Ge1-x is a possible cause to generate such strain behavior. The understanding of compositional and strain characteristics is important in Ge/Si heterostructure as these properties seem to give significant effects in device performance.

* Title and MeSH Headings from MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine.